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Quantum spin Hall insulators in centrosymmetric thin films composed from topologically trivial BiTeI trilayers

机译:量子自旋霍尔绝缘子由中心对称薄膜组成   拓扑琐碎的BiTeI三层

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摘要

The quantum spin Hall insulators predicted ten years ago and nowexperimentally observed are instrumental for a breakthrough in nanoelectronicsdue to non-dissipative spin-polarized electron transport through their edges.For this transport to persist at normal conditions, the insulators shouldpossess a sufficiently large band gap in a stable topological phase. Here, wetheoretically show that quantum spin Hall insulators can be realized inultra-thin films constructed from a trivial band insulator with strongspin-orbit coupling. The thinnest film with an inverted gap large enough forpractical applications is a centrosymmetric sextuple layer built out of twoinversely stacked non-centrosymmetric BiTeI trilayers. This nontrivial sextuplelayer turns out to be the structure element of an artificially designed strongthree-dimensional topological insulator Bi$_2$Te$_2$I$_2$. We reveal generalprinciples of how a topological insulator can be composed from the structureelements of the BiTeX family (X=I, Br, Cl), which opens new perspectivestowards engineering of topological phases.
机译:十年前预测并现在通过实验观察到的量子自旋霍尔绝缘子,由于通过其边缘的非耗散自旋极化电子传输而有助于纳米电子学的突破。为使这种传输在正常条件下持续存在,绝缘子应在硅上具有足够大的带隙。稳定的拓扑阶段。在这里,我们从理论上证明,量子自旋霍尔绝缘体可以实现于由具有强自旋-轨道耦合的琐碎带状绝缘体构成的超薄膜。具有足够大的倒间隙的薄膜,最适合实际应用的是由两个反向堆叠的非中心对称BiTeI三层构成的中心对称六元组层。该非平凡的六元层原来是人工设计的强三维三维拓扑绝缘体Bi $ _2 $ Te $ _2 $ I $ _2 $的结构元素。我们揭示了BiTeX族(X = I,Br,Cl)的结构元素如何构成拓扑绝缘体的一般原理,这为拓扑相的工程化开辟了新的视角。

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